PURE COPPER MATERIAL, INSULATING SUBSTRATE, AND ELECTRONIC DEVICE

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United States of America

APP PUB NO 20250109462A1
SERIAL NO

18839782

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Abstract

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This pure copper material includes Cu in an amount of 99.9 mass % or more and 99.999 mass % or less, an average crystal grain size in a rolled surface is 10 μm or more, and when a measurement area of 1 mm2 or more is measured by an EBSD method at a measurement interval of 1 μm, measurement points at which a CI value obtained by an analysis using data analysis software OIM is 0.1 or less are excluded, and boundaries between adjacent pixels with a misorientation of 5° or more are regarded as crystal grain boundaries, an average of local orientation spread (LOS) is 2.00° or less.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI MATERIALS CORPORATIONCHIYODA-KU TOKYO 100-8117

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ITO, Yuki Kitamoto-shi, JP 259 1097
KAWASAKI, Kenichiro Kitamoto-shi, JP 26 244
MAKI, Kazunari Kitamoto-shi, JP 74 205
ODAIRA, Takumi Kitamoto-shi, JP 3 0

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