ATOMIC LAYER ETCHING OF METALS USING NOVEL CO-REACTANTS AS HALOGENATING AGENTS

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250109501A1
SERIAL NO

18728534

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Abstract

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The disclosed and claimed subject matter relates to thermal atomic layer etch (ALE) processing of metals and alloys thereof (e.g., cobalt and cobalt alloys) using thionyl chloride (SOCl2) or a combination of thionyl chloride and pyridine.

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Patent Owner(s)

Patent OwnerAddress
EMD PERFORMANCE MATERIALS CORP70 MEISTER AVENUE BRANCHBURG NJ 08876

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
DEZELAH, Charles Helsinki, FI 105 1634
KANJOLIA, Ravindra North Andover, US 11 1
MCBRIARTY, Martin San Jose, US 1 0
MOINPOUR, Mansour San Jose, US 31 260
PARSONS, Gregory Raleigh, US 6 109
SAARE, Holger Raleigh, US 6 0
WOODRUFF, Jacob Lexington, US 26 1871
XIE, Wenyi Elmhurst, US 2 0

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