LIQUID PROCESSING APPARATUS, AND MONITORING METHOD

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250112066A1
SERIAL NO

18899015

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Abstract

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A liquid processing apparatus includes multiple stages on each of which a substrate is to be placed; multiple nozzles shared by the multiple stages, and each for supplying a processing liquid to the substrate; a camera shared by the multiple nozzles, and for monitoring states of the multiple nozzles; and an imaging condition changing program module for causing circuitry to change an imaging condition of the camera according to a monitoring condition.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325 ?1076325

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HAYAMA, Takafumi Koshi City, JP 15 82
IIDA, Shigeyuki Sapporo City, JP 2 3
INTO, Shunsuke Koshi City, JP 1 0
ISHIMARU, Daisuke Koshi City, JP 10 28
KUNUGIMOTO, Yuichiro Koshi City, JP 14 12
MATSUTAKE, Yuki Koshi City, JP 2 0
MIZUSHINO, Shinichi Koshi City, JP 5 3
TOYOZAWA, Akihiro Koshi City, JP 4 8

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