MAINTENANCE DEVICE, VACUUM PROCESSING SYSTEM, AND MAINTENANCE METHOD
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United States of America
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Issued Date -
Apr 3, 2025
app pub date -
Dec 11, 2024
filing date -
Dec 11, 2024
priority date (Note) -
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Abstract
There is provided a maintenance device comprising: a case having an opening whose size corresponds to a second gate of a vacuum processing device disposed in a processing chamber having a first gate and the second gate different from the first gate, the first gate and the second gate being used for loading and unloading substrates, the opening being capable of being attached to the second gate in a detachable manner and an airtight manner; a depressurization mechanism configured to reduce a pressure in the case; and a suction mechanism disposed in the case and configured to enter the processing chamber through the opening and conduct suction of deposits on an object in the processing chamber.
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