CHEMICAL LOOPING SYSTEM, MATERIAL FOR CHEMICAL LOOPING SYSTEM AND PRODUCTION METHOD OF MATERIAL FOR CHEMICAL LOOPING SYSTEM

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United States of America

APP PUB NO 20250114761A1
SERIAL NO

18729757

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Abstract

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A chemical looping system includes repeating: a generation process of reacting a reduced form of a material for the chemical looping system, which contains a first element selected from the group consisting of Co and Ni and a second element selected from the group consisting of In and Ga, with carbon dioxide so as to generate an oxidized form of the material for the chemical looping system, in which the second element is oxidized by the reaction, and carbon monoxide, and a reduction treatment of reacting the oxidized form with a reducing agent and thus reducing the second element having been oxidized in the generation process so as to thereby convert the oxidized form back into the reduced form.

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Patent Owner(s)

Patent OwnerAddress
WASEDA UNIVERSITY104 TOTSUKAMACHI 1-CHOME SHINJUKU-KU TOKYO 169-8050
ENEOS CORPORATION1-2 OTEMACHI 1-CHOME CHIYODA-KU TOKYO 1008162

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HIRANO, Yuichiro Chiyoda-ku, Tokyo, JP 8 14
ITO, Naoki Chiyoda-ku, Tokyo, JP 284 2331
MAKIURA, Junichiro Shinjuku-ku, Tokyo, JP 1 0
SEKINE, Yasushi Shinjuku-ku, Tokyo, JP 16 137

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