Importance

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Abstract

A substrate processing apparatus includes: a plurality of first mist nozzles provided inside a chamber and arranged at a predetermined second interval along an arrangement of a plurality of substrates; and a plurality of second mist nozzles provided inside the chamber and arranged at the second interval along the arrangement of the plurality of substrates. The first mist nozzles are disposed on opposite sides of the second mist nozzles, with respect to the substrates in plan view. The first and second mist nozzles are disposed in a manner facing the substrates in plan view. The first mist nozzles are arranged in a manner offset from the respective second mist nozzles by a length corresponding to a half the second interval in the direction of the arrangement of the substrates W. Each of the first and second mist nozzles sprays the liquid as at least one of mist and droplets.

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First Claim