POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND POLISHING METHOD OF SUBSTRATE USING THE SAME

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United States of America

APP PUB NO 20250115787A1
SERIAL NO

18901849

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Abstract

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A polishing composition for a semiconductor process includes abrasive particles, a polyoxyalkylene-based surfactant, and a skew inhibitor of Formula 1 below. The polyoxyalkylene-based surfactant has a hydrophile-lipophile balance (HLB) value of 13 or higher.

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Patent Owner(s)

Patent OwnerAddress
SK ENPULSE CO LTDPYEONGTAEK-SI GYEONGGI-DO 17784

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHOI, Yongsoo Seoul, KR 17 1
HAN, Deok Su Seoul, KR 18 0
PARK, Han Teo Seoul, KR 19 3

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