RESIST COMPOSITION AND PATTERN FORMING PROCESS
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United States of America
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Issued Date -
Apr 10, 2025
app pub date -
Oct 1, 2024
filing date -
Oct 1, 2024
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Abstract
A resist composition comprising a bisonium salt containing a divalent anion having a sulfonate anion structure having a fluorine atom or a trifluoromethyl group at α- or β-position and linked to an aromatic group having an iodine atom or a bromine atom and a sulfonimide anion structure or a sulfonamide anion structure bonded to the aromatic group having an iodine atom or a bromine atom, via a linking group having 1 or more carbon atoms, and an onium cation.
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