SUBSTRATE COATING RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20250116928A1
SERIAL NO

18954045

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Abstract

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Provided is a substrate coating resist composition containing a polymer (A) having a specific structure as defined herein and a photoacid generator (B) having a specific structure as defined herein.

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Patent Owner(s)

Patent OwnerAddress
MERCK PATENT GMBHFRANKFURTER STRASSE 250 64293 DARMSTADT GERMANY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KUBO, MASAHIKO KAKEGAWA, JP 120 897
TAKAICHI, TETSUMASA KAKEGAWA, JP 6 0

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