MULTIBLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS
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United States of America
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Apr 10, 2025
app pub date -
Oct 4, 2023
filing date -
Oct 4, 2023
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Abstract
A block copolymer including a first block comprising two or more structurally different repeating units; a second block comprising two or more structurally different repeating units; a repeating unit of the first block comprises an acid-labile group, a lactone group, a salt group, or a hydroxyaryl group; and a repeating unit of the second block comprises an acid-labile group, a lactone group, a salt group, or a hydroxyaryl group, wherein the two or more structurally different repeating units of the first block are the same as the two or more structurally different repeating units of the second block.
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