ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS
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United States of America
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Issued Date -
Apr 10, 2025
app pub date -
Oct 1, 2024
filing date -
Oct 1, 2024
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Abstract
An onium salt monomer containing an aromatic sulfonic acid anion having a vinyl-substituted aromatic ring is provided as well as a polymer comprising repeat units derived from the monomer. A chemically amplified resist composition comprising the polymer has advantages including high sensitivity, high contrast, improved lithography properties, e.g., EL, LWR, CDU and DOF, collapse resistance during fine pattern formation, and etch resistance after development.
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