MANUFACTURING METHOD AND MANUFACTURING APPARATUS OF SEMICONDUCTOR SUBSTRATE, AND CONTROL DEVICE
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United States of America
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Apr 10, 2025
app pub date -
Jan 26, 2023
filing date -
Jan 26, 2023
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Abstract
A manufacturing method of a semiconductor substrate includes a step of growing a nitride semiconductor portion from an upper surface of a base substrate exposed in an opening portion of a mask, a step of irradiating a mask portion and the nitride semiconductor portion being grown with first light having a wavelength absorbed by the nitride semiconductor portion at a growth temperature, a step of receiving second light from a semiconductor substrate, and a step of transitioning a growth condition of the nitride semiconductor portion from a first condition to a second condition.
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