Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures
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United States of America Patent
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Feb 19, 1980
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N/A
app pub date -
Nov 1, 1977
filing date -
Apr 29, 1975
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Abstract
A light-sensitive coating composition and a light-sensitive photomechanical structure, such as a printing plate or a photoresist is produced by coating a suitable planar substrate with a condensation product of an organic isocyanate and a polymeric resin having functional groups reactive with the isocyanate, such as a phenol-formaldehyde resin, and a light-sensitive diazo compound, such as the esters and amides of quinone diazides, the coating being softenable by exposure to light and subsequent treatment with a conventional liquid printing plate developer, such as an aqueous alkaline solution and/or an organic solvent.
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