Positive developing method and apparatus
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United States of America Patent
Stats
-
Apr 8, 1980
Grant Date -
N/A
app pub date -
May 23, 1978
filing date -
May 23, 1978
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A positive developer and method spraying developer solution against rotating wafers stacked along rotation axis to remove photoresist and recycling the developer solution in successive cycles and batches of wafers being processed; adding small quantities of fresh developer solution in each cycle of operation to replace the small quantity lost and rinsed down the drain at the end of each cycle, thereby maintaining the strength of the developer solution and equilibrium to establish a predetermined time per cycle needed for completing removal of photoresist; rinsing away the developer solution from the wafers and interior of the spray chamber with deionized water and subsequently applying heated nitrogen to accomplish drying of everything within the chamber.
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