Photon absorbing surfaces and methods for producing the same
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United States of America Patent
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Jun 24, 1980
Issued Date -
N/A
app pub date -
Dec 23, 1977
filing date -
Jul 26, 1977
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Photon absorbing surfaces which are effective over a broad band of photon energies are described. These surfaces consist of a two-phase material with a protruding second phase whose dimensions are on the order of microns. Photons are absorbed by multiple reflections within the region of the protruding phase. The surfaces are produced by directional solidification of eutectic compositions to produce aligned second phase microstructures within a metallic matrix. The matrix material is then selectively removed to expose the second phase material.
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