Mask analysis

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United States of America Patent

PATENT NO 4218142
SERIAL NO

05884606

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Masks used in the production of integrated circuits are analyzed and tested by a scanning spot from a laser beam comparing the position signal of the scan from a mask against a data base representing another mask which may be selected at random. Apparatus includes a laser, means to form and scan a minute spot from said laser, an x-y stage to move a mask under the scan, a detector, and means to compare scan results.

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Patent Owner(s)

  • BAYBANK MIDDLESEX;AERODYNE PRODUCTS CORPORATION, A CORP. OF MA.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Killam, R William Tewksbury, MA 1 32
Kryger, David L Chelmsford, MA 3 84

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