Multidrain metal-oxide-semiconductor field-effect

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United States of America Patent

PATENT NO 4219828
SERIAL NO

05966502

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A metal-oxide-semiconductor field-effect device for constituting a single logic inverter stage. It includes a multidrain transistor operating in enhancement mode and a load transistor, both of monochannel metal-oxide-semiconductor structure. The inverter transistor comprises a single gate region and several drain regions. The single gate region and the single channel region of the inverter multidrain transistor are superimposed on both implantation planes separated by a thin insulating layer, entirely surround each drain region of the inverter multidrain transistor and are entirely surrounded by the single source region of the inverter multidrain transistor.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lardy, Jean-Louis Lotissement les Iris no. 23, Le Versoud-Domene, FR 1 12
Majos, Jacques 4, Rue du Dauphine, Lannion, FR 7 58

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