Pyrocatechol-amine-water solution for the determination of defects
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United States of America Patent
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-
Dec 9, 1980
Grant Date -
N/A
app pub date -
Dec 29, 1978
filing date -
Dec 29, 1978
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The invention is directed to a novel method for detecting surface damage to polished silicon wafers. For very fine defects and scratches an oxidation step is used. The oxide is removed and the wafer is treated in an etch solution containing pyrocatechol, ethylene diamine and water. The defects are detectable by the naked eye.
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