Two layer resist system
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United States of America Patent
Stats
-
Dec 9, 1980
Issued Date -
N/A
app pub date -
Aug 24, 1978
filing date -
Aug 24, 1978
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A resist mark comprising two layers of resist, one of which is saturated with a diluant which does not dissolve the other. In one embodiment, the two layers of resist are applied upon a substrate, the first layer of which is more soluble in a developer. The second layer is said saturated resist and the first layer is non-saturated. This composite is preferably used to form a relief mask with recessed sidewalls used in lift-off processes.
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Cited Art Landscape
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