Surface-treating agent adapted for intermediate products of a semiconductor device
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United States of America Patent
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Dec 16, 1980
Issued Date -
N/A
app pub date -
Jul 21, 1978
filing date -
Nov 26, 1975
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A surface-treating agent formed of an aqueous solution containing 0.01 to 20% by weight of trialkyl(hydroxyalkyl) ammonium hydroxide. The treating agent is adapted to be used for the effective removal of organic and inorganic contaminants deposited on the surface of intermediate semiconductor products obtained in the respective steps of manufacturing a semiconductor device and the efficient etching of a metal layer used as wiring. Further, it can be used for the elimination of those portions of a positive working photoresist film coated on the surface of the intermediate semiconductor products which are and are not exposed to a light by controlling its concentration.
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