Method for controlling plasma chemical reactions
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United States of America Patent
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-
Dec 30, 1980
Grant Date -
N/A
app pub date -
Mar 20, 1979
filing date -
Mar 23, 1978
priority date (Note) -
Expired
status (Latency Note)
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Abstract
In a plasma chemical reaction carried out with at least one gas, the plasma constants in the progress of reaction such as electron temperature, electron density and electron energy distribution function can be measured by use of a probe heated to a high temperature which is made of a metal having a small thermionic electron emission at a high temperature. The plasma chemical reaction can be performed in the steady state with satisfactory reproduction of composition, structure, yield and performance of the product by controlling the pressure, input power and gas flow rate in the plasma reactor so that the measured plasma constants always coincide with the predetermined plasma constants necessary for effecting the intended chemical reaction which have been obtained through a preliminary experiment.
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