Phenol-free photoresist stripper
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United States of America Patent
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Dec 30, 1980
Issued Date -
N/A
app pub date -
Nov 8, 1976
filing date -
Nov 8, 1976
priority date (Note) -
Expired
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Abstract
Stripping solutions, free from phenol compounds, comprising at least 30 weight percent of an unsubstituted or alkyl substituted aryl sulfonic acid have been found effective for removal of organic polymeric substances from inorganic substrates. The novel compositions comprise 30-80 percent of one or more of the sulfonic acids in admixture with chlorinated aryl compounds, alkylaryl compounds having 1-14 alkyl carbons, an isoparaffinic hydrocarbon, or mixtures thereof.
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