Spin coating process
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United States of America Patent
Stats
-
May 12, 1981
Grant Date -
N/A
app pub date -
Sep 19, 1979
filing date -
Sep 20, 1978
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A process for spin coating a substrate such as a semi-conductor wafer uniformly with a coating solution such as a photographic emulsion by rotating the substrate at a first speed while simultaneously applying the coating solution at a radially moving position. Once the substrate has been initially covered, the speed of rotation of the substrate is increased and rotation continues until a uniform coating is obtained.
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Cited Art Landscape
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