Importance

Loading Importance Indicators...

Abstract

An exposure apparatus using an electron beam includes a first memory for storing pattern data representing various basic patterns, a data processor for reading from the first memory the pattern data necessary to form a pattern to be drawn, a second memory for storing data which correspond to the pattern data readout from the first memory by the data processor, and an electron beam generator for generating an electron beam according to the data stored in the second memory to achieve a raster scanning on a test piece. The first memory stores pattern parameters representing said various basic patterns. The exposure apparatus further includes a dot pattern data generator which writes into the second memory dot pattern data which correspond to the pattern parameters readout from the first memory by the data processor.

Loading the Abstract Image...

First Claim