Dry Lithographic Process
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United States of America Patent
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-
Aug 11, 1981
Grant Date -
N/A
app pub date -
Mar 25, 1980
filing date -
Mar 29, 1979
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A plasma-polymerized film formed on the surface of a substrate is found to be suitable for subsequent use in electron-beam lithography and the film exposed to a beam of electrons is then developed to provide it with the predetermined pattern. These steps of plasma polymerization, electron-beam exposure and development can be consecutively carried out in vapor phase within a unified vacuum apparatus.
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