Importance

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Abstract

Disclosed is a novel hole trapping layer and the use of this layer in an overcoated photoresponsive device, this hole trapping layer being comprised of materials of the following formulas: ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, and R.sup.6 which may be the same or different radicals, are selected from aliphatic, substituted aliphatic, aromatic, and substituted aromatic, the substituents including for example alkyl, halogen and the like, x and y are numbers from 2 to about 10 and preferably from 2 to about 4, m and n are numbers of from 1 to 3, the sum of m and n being equal to 4, and Z is a sulfonyl (--SO.sub.2) or a carboxyl (--CO.sub.2) radical. Examples of aliphatic radicals include alkyl of from 1 to about 20 carbon atoms such as methane, ethane, propane, butane, isobutane, pentane, neopentane, heptane, decane, tetradecane, eicosane, and the like. Illustrative examples of aromatic radicals include those containing from about 6 to about 20 carbon atoms such as phenyl, naphthyl, anthryl and the like.

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First Claim