Sensitizers for photopolymerization

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United States of America Patent

PATENT NO 4308400
SERIAL NO

06108277

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Aromatic-aliphatic ketones of the formulae I, II, III or IV ##STR1## wherein n is 1 or 2, Ar is an aryl radical, R.sup.1 and R.sup.2 are monvalent aliphatic, cycloaliphatic or araliphatic radicals, R.sup.3 is a direct bond or a divalent organic radical, X is a hydroxyl or amino group or the monovalent etherification or silylation products thereof, and X' is a divalent amino, ether or silyloxy group, Y is a direct bond or CH.sub.2 and Z is O, S, SO.sub.2, CH.sub.2 or C(CH.sub.3).sub.2, are suitable sensitizers for the photopolymerization of unsaturated compounds and for the photochemical crosslinking of polyolefins. Some of these compounds are novel and can be obtained by methods analogous to those for obtaining the known compounds of this type.

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Patent Owner(s)

  • CIBA SPECIALTY CHEMICALS CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Felder, Louis Basel, CH 14 583
Husler, Rinaldo Binningen, CH 40 878
Kirchmayr, Rudolf Aesch, CH 34 844

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