Method for improving the efficiency of solar cells having imperfections

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United States of America Patent

PATENT NO 4343830
SERIAL NO

06206422

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Method and apparatus for minimizing the deleterious effects of structural imperfections in polycrystalline silicon solar cells uses a high pressure plasma system. The high pressure plasma system is used to introduce atomic hydrogen into the polycrystalline silicon substrates or into polycrystalline silicon solar cells. The silicon can be subjected to the hydrogenation either before or after it has a junction. The high pressure plasma system includes a high pressure chamber having a first and a second auxiliary chamber coupled to the high pressure chamber.

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Patent Owner(s)

Patent OwnerAddress
MOTOROLA INC A CORP OF DESCHAUMBURG IL

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Legge, Ronald N Scottsdale, AZ 19 378
Sarma, Kalluri R Tempe, AZ 57 1450

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