Semiconductor device having a registration mark for use in an exposure technique for micro-fine working
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United States of America Patent
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Oct 26, 1982
Grant Date -
N/A
app pub date -
Feb 23, 1981
filing date -
Feb 28, 1980
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A registration mark to be used for a micro-fine working technique such as LSI's includes a smaller protrusion pattern within a larger recess pattern formed in a surface of the semiconductor substrate. The recess and protrusion patterns are used for coarse and fine positioning, respectively. The protrusion pattern implements precise positioning because it is isolated from other regions.
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