Process and arrangement for copying masks on a workpiece with arrangement for correction of alignment errors
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 7, 1982
Grant Date -
N/A
app pub date -
Oct 14, 1980
filing date -
Feb 14, 1979
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
In a process and an arrangement for the copying of masks on a workpiece, especially for the projection copying on a semiconductor substrate for the production of integrated circuitries, a mask pattern is imaged on respective different, predetermined areas of the workpiece by a shifting of the workpiece in the image plane. In order to increase the accuracy of the individual imagings, the alignment error between the image of the mask pattern and the predetermined area of the workpiece is determined during the imagings of the mask pattern on the workpiece. The predetermined value of the displacement of the workpiece to the area for a subsequent imaging or the position of the mask is corrected to the extent of the alignment error.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully