Thin film resistance thermometer device with a predetermined temperature coefficent of resistance and its method of manufacture
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United States of America Patent
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Feb 22, 1983
Grant Date -
N/A
app pub date -
Feb 29, 1980
filing date -
Feb 29, 1980
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A thin film resistance thermometer is manufactured to have a predetermined temperature coefficient of resistance while minimizing the amount of metal in the film. The process involves the production of a metal film deposit on an insulating substrate such that the film deposited has a bulk coefficient substantially higher than the desired coefficient with the film being deposited to a thickness that produces the desired coefficient.
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