Importance

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Abstract

A system for driving a rotary member for implanting ions into wafers of semiconductor devices includes a first vacuum chamber receiving the rotary member connected to a rotary shaft through a vacuum seal supported in the central portion of a shield which defines a part of the first vacuum chamber, and a second vacuum chamber receiving a peripheral portion of a shield in airtight relation. The shield is supported by two pairs of O-rings mounted in the second vacuum chamber and arranged in juxtaposed relation on opposite sides of the peripheral portion of the shield. The O-rings provide a hermetical seal to the first and second vacuum chambers. A motor is operatively connected to the rotary shaft for rotating the rotary member, and the shield is connected to another motor through a nut-and-screw arrangement. By moving the shield in reciprocatory movement to cause the peripheral portion to move in sliding movement in the second vacuum chamber, the rotary member can be moved in reciprocatory movement in the plane of its rotation without the risk of the vacuum in the first vacuum chamber being interferred with.

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First Claim