Method of making x-ray masks

United States of America Patent

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May 24, 1983
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N/A
app pub date
Jul 25, 1980
filing date
Nov 13, 1978

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Expired

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Abstract

An x-ray mask is made by forming a thin polyimide membrane on a silicon wafer substrate which is then back-etched to form a mask supporting ring of the substrate.

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Patent Owner(s)

Patent Owner	Address
SPERRY RAND CORPORATION A CORP OF DE	1290 AVENUE OF THE AMERICAS NEW YORK NY 10019

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Inventor Name	Address	# of filed Patents	Total Citations
Casey, Martin J	Lansdale, PA	4	16

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Method of making x-ray masks

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United States of America Patent

06172115

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PATENT NO	4384919
SERIAL NO	06172115
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06172115

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