High-voltage photovoltaic cell having a heterojunction of amorphous semiconductor and amorphous silicon

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United States of America Patent

PATENT NO 4388482
SERIAL NO

06266064

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A p-i-n amorphous silicon photovoltaic cell of improved conversion efficiency is obtained by incorporating, as either the p or n type side of the cell exposed to the incident light, an amorphous semiconductor which satisfies the requirements that the optical band gap, Eg.opt, be not less than about 1.85 eV, the electric conductivity be not less than about 10.sup.-8 (.OMEGA..cm).sup.-1 the p-i-n junction diffusion potential, Vd, be not less than about 1.1 volts, and be formed of a substance represented by one of the general formulas, a-Si.sub.1-x C.sub.x and a-Si.sub.1-y N.sub.y.

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Patent Owner(s)

Patent OwnerAddress
KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA A CORP OF JAPAN2-4 3-CHOME NAKANOSHIMA KITA-KU OSAKA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hamakawa, Yoshihiro 3-17-4, Minami-Hanayashiki Kawanishi, Hyogo, JP 42 950
Tawada, Yoshihisa 14-39, Oike-Miyamadai, Kita-Ku, Kobe, Hyogo, JP 54 983

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