Method of forming silicone films

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United States of America Patent

PATENT NO 4395443
SERIAL NO

06262272

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Abstract

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There is provided a silicone film-forming composition and method for forming dust-resistant films from such compositions which are comprised of a condensation product of a benzene soluble polysiloxane and a silanol terminated polydiorganosiloxane in combination with a mixed solvent comprised of a volatile organosilicon compound and a hydrocarbon solvent.

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Patent Owner(s)

Patent OwnerAddress
TOSHIBA SILICONES LIMITED2-31 ROPPONGI 6-CHOME MINATO-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hosokowa, Kiyoshi Ohta, JP 1 19
Shimizu, Chiyuki Ohta, JP 16 122

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