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Abstract

A plurality of memory cells are arranged on a semiconductor substrate in the matrix form. Each memory cell comprises a first MOS field effect transistor whose drain electrode is connected to a read bit line, and whose source electrode is connected to a read word line, and a second MOS field effect transistor whose source electrode is connected to the gate electrode of the first MOS field effect transistor, and whose drain electrode is connected to a write bit line, and whose gate electrode is connected to a write word line. The first MOS field effect transistor is formed in the surface region of the semiconductor substrate and the second MOS field effect transistor is formed of a polycrystalline silicon layer, which is deposited on the semiconductor substrate with an oxide layer interposed therebetween to act as the gate region of the first MOS field effect transistor.

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First Claim