Plasma etching process and apparatus

United States of America Patent

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Sep 20, 1983
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app pub date
Jun 9, 1982
filing date
Jul 24, 1980

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Expired

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Abstract

A plasma etching process and apparatus wherein a gas plasma comprising dichlorofluoro-methane (CHCl.sub.2 F) etches a film.

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Patent Owner(s)

Patent Owner	Address
SPERRY RAND CORPORATION 1290 AVENUE OF THE AMERICAS NEW YORK NY 10019 A DE CORP	NY

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Inventor Name	Address	# of filed Patents	Total Citations
Casey, Martin J	Mesa, AZ	4	16
Sheppard, John E	Bensalem, PA	3	56

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Plasma etching process and apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

06386826

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PATENT NO	4405406
SERIAL NO	06386826
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06386826

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