Apparatus and process for production of amorphous semiconductor
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United States of America Patent
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Sep 27, 1983
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N/A
app pub date -
Dec 16, 1980
filing date -
Jan 28, 1980
priority date (Note) -
Expired
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Abstract
A process for producing an amorphous semiconductor membrane. A predetermined gas is introduced into a vacuum chamber which is decomposed by a discharge phenomenon. The discharge phenomenon is caused by an electric field made up of a high frequency electric field or pulsed electric field superposed on a DC electric field.
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