Gas flow arrangement

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United States of America Patent

PATENT NO 4412479
SERIAL NO

06256014

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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To achieve uniform gas flow in a chamber to which gas is fed from a cylindrical pipe, the pipe has a closed end wall, at least two spaced rectangular apertures on one side near said end wall and, between each adjacent pair of apertures, a radial partition wall, having a central circular aperture. The arrangement is applicable to gas flow to a gas burner or a gas filter.

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Patent Owner(s)

Patent OwnerAddress
ESTEL HOOGOVENS B V P O BOX 10 000 1970 CA IJMUIDEN THE NETHERLANDSNot Provided

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kramer, Albert Enkhuizen, NL 2 10
Mooij, Johannes W IJmuiden, NL 1 1
Ouwerkerk, Johannes H W Driehuis, NL 4 62

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