Methylene chloride-methane sulfonic acid stripping compositions and methods for using same
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United States of America Patent
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Jan 17, 1984
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N/A
app pub date -
Dec 23, 1981
filing date -
Jul 7, 1980
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Expired
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Abstract
Methylene chloride-methane sulfonic acid compositions used in removing polymeric organic substances from inorganic substrates, such as polymeric adhesives from metal and lense glass parts and positive and negative photoresists from metallized silicon/silicon dioxide wafers, which comprise an effective amount, usually about 1 to 40 percent by weight methane sulfonic acid and the balance methylene chloride are described. Methods for using the above composition at ambient temperatures to remove the polymeric organic substances from the metal and non-metallic inorganic substrates are also described.
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