Photopolymerizable mixtures containing elastomeric block polymers and photocurable elements produced therefrom

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United States of America Patent

PATENT NO 4430417
SERIAL NO

06419492

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Abstract

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Photopolymerizable mixtures of (a) one or more block copolymers, (b) one or more photopolymerizable, ethylenically unsaturated, low molecular weight compounds and (c) a photopolymerization initiator, with or without (d) other additives, contain as component (a) block copolymers which are composed solely of elastomeric polymer blocks, and contain two or more elastomeric polymer blocks having a glass transition temperature of from -20.degree. C. to +15.degree. C., linked by one or more elastomeric polymer blocks having a glass transition temperature of below -20.degree. C.

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Patent Owner(s)

Patent OwnerAddress
BASF AKTIENGESELLSCHAFT 6700 LUDWIGSHAFEN RHEINLAND-PFALZ GERMANY6700 LUDWIGSHAFEN RHEINLAND-PFALZ

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Heinz, Gerhard Weisenheim, DE 65 785
Mueller, Wolfgang F Neustadt, DE 15 223
Richter, Peter Frankenthal, DE 42 515

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