Exposure light beams control method for use in a picture reproducing machine
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United States of America Patent
Stats
-
Feb 21, 1984
Grant Date -
N/A
app pub date -
Apr 10, 1981
filing date -
Apr 10, 1980
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method for controlling exposure light beams for use in a picture reproducing machine such as a color scanner and a color facsimile, wherein a light beam is supplied to an acoustooptical deflector and is deflected thereby to obtain diffraction light beams which are incident to fixed light paths and are used for exposing a recording film, and wherein the diffraction light beams are controlled by varying a frequency of a supersonic wave supplied to the acoustooptical deflector so that each diffraction light beam may be or may not be incident to the respective light path.
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Cited Art Landscape
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