Chalcogenide product
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United States of America Patent
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-
Feb 28, 1984
Issued Date -
N/A
app pub date -
Jan 5, 1981
filing date -
Oct 17, 1979
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A layer of a chalcogenide glass resist material, on a substrate on which a microlithographic pattern is to be formed, has a deposit of silver halide on its outer surface. By actinic irradiation a latent silver image replicating the desired pattern is formed in the halide deposit. This image is developed to a metallic silver, which is used to photodope the resist material for subsequent etching to produce the microlithographic pattern on the substrate. Positive and negative patterns are possible from the same starting laminate. One form of a microlithograhic pattern is a mask for producing electronic circuits.
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