Plasma treating apparatus
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United States of America Patent
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-
Mar 20, 1984
Grant Date -
N/A
app pub date -
Oct 28, 1981
filing date -
Nov 5, 1980
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A plasma treating apparatus includes: an air-core coil for generating a static magnetic field which is axially uniform and a high-frequency waveguide for generating a high-frequency electromagnetic field which is irregular in the axial direction of the air-core coil. A plasma generating glass tube is disposed in the high-frequency waveguide and adapted to be supplied with a gas and a plasma reaction bath held under a vacuum for receiving the plasma flow which is generated axially in the glass tube. A substrate platform is disposed in the reaction bath for supporting a substrate to be treated at a right angle with respect to the plasma flow. There is also included a magnetic field generating coil disposed outside of said reaction bath for shaping the plasma.
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