Cathodic sputtering apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
Apr 17, 1984
Grant Date -
N/A
app pub date -
Aug 17, 1983
filing date -
Aug 17, 1983
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A rotatable magnetron cathode comprising an elongated cylindrical tubular member, magnetic means disposed in said tubular member, a plurality of individual target strips provided with the same or different coating materials to be sputtered removably secured to the tubular member, said target strips extending the axial direction of the tubular member and disposed in spaced parallel relation around the periphery thereof, and means for rotating or indexing the tubular member to bring selected target strips in position for sputtering opposite the magnetic means.
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