Importance

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Abstract

A liquid spray apparatus provides predetermined, uniform quantity of liquid (such as photoresist developer) per unit area of surface by a parabolic cam mechanism, arranged to repeatedly reciprocate a nozzle at a predetermined varying linear velocity a plurality of times over a spinning surface, such as a semiconductor device wafer. The mechanism moves the nozzle at a parabolic varying velocity whereby the liquid is deposited at a uniform quantity per unit area. The cam is continuously rotated and engaged with a spring-biased cam follower during the spraying period. The cam follower is engaged and disengaged with the cam by a programable timer defining the spraying period.

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First Claim