Exposure apparatus for production of integrated circuit
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United States of America Patent
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-
Aug 14, 1984
Grant Date -
N/A
app pub date -
Dec 30, 1981
filing date -
Jan 14, 1981
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An exposure apparatus for production of ICs of the type that includes a stage on which is placed a semiconductor wafer to be exposed by illumination light projecting means, and means for two-dimensionally moving the stage within a plane intersecting the illumination light at substantially right angles. The improvement comprises illumination detection means provided with a photo reception surface, and means for mounting the illumination detection means on the stage in such a manner that the photo reception surface and the surface of the semiconductor wafer on the stage to be exposed are at substantially equal height relative to the stage.
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