Plasma deposition apparatus for photoconductive drums
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United States of America Patent
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Aug 21, 1984
Grant Date -
N/A
app pub date -
Jan 10, 1983
filing date -
Jan 10, 1983
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
This invention is directed to an apparatus for preparing semiconducting and photoelectronic devices comprised of a first electrode means, a second counter electrode means, a receptacle means for the first electrode means and the second counter electrode means, a substrate means to be coated contained on the first electrode means, which substrate is in the form of a cylindrical member, and a gas inlet means, a gas exhaust means, wherein a silane gas is introduced into the receptacle in a crossflow direction, perpendicular to the axis of the cylindrical member.
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