Thin film resistance thermometer with a predetermined temperature coefficient of resistance and its method of manufacture
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United States of America Patent
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Sep 4, 1984
Issued Date -
N/A
app pub date -
Nov 2, 1981
filing date -
Feb 29, 1980
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A thin film resistance thermometer is manufactured to have a predetermined temperature coefficient of resistance while minimizing the amount of metal in the film. The process involves the production of a metal film deposit on an insulating substrate such that the film deposited has a bulk coefficient substantially higher than the desired coefficient with the film being deposited to a thickness that produces the desired coefficient.
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