Process of making a printed circuit using dry film resists
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United States of America Patent
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Oct 23, 1984
Issued Date -
N/A
app pub date -
Apr 12, 1982
filing date -
Sep 23, 1980
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A resist film composed of a water-soluble polyvinyl alcohol, a water-soluble thermosetting polymethylol cross-linking agent and a polyaryl iodonium or sulfonium salt of a complex halogenide as catalyst, when irradiated with ultraviolet light and then heated, or when heated and irradiated with ultraviolet light, under a circuit mask, provides a latent image which is developable by water alone.
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